High-Throughput Fabrication of Large-Scale Metaholograms via One-step Printing

초록

Metasurfaces, which are designed by arranging meta-atoms, have attracted attention for their ability to create optical properties that do not exist in nature. However, previous methods for fabricating metasurfaces using electron-beam lithography (EBL) are expensive and have limited production capacity, inhibiting mass production. In this study, a new manufacturing method is demonstrated using an argon fluoride (ArF) scanner and nanoimprint lithography (NIL) to overcome these limitations. 266 millimeter-scale metasurfaces are designed and fabricated on an 8-inch wafer using an ArF scanner. Subsequently, this is used as a master stamp to replicate the metasurfaces in an 8-inch wafer scale through the NIL process all at once. To demonstrate the effectiveness of this method, a metahologram is designed and manufactured using TiO2 nanoparticle-embedded-resin (nano-PER). The metahologram achieves an 81.2% yield during replication, with a maximum efficiency of 60.7% at 450 nm, 45.1% at 532 nm, and 38.5% at 635 nm, respectively. The results demonstrate the production of practical metaholograms using low-cost and high-throughput processes. © 2024 Wiley-VCH GmbH.

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