Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy

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초록

Undercut defects of color filter (CF) layers, which inevitably occur in UV curing and development processes for liquid crystal displays and white organic light-emitting diodes, should be elucidated to ensure product quality and processability. The dynamic changes of the green CF layer are investigated during the baking process by examining the motion of pigment particles within the thin CF layer via multi-speckle diffusing wave spectroscopy (MSDWS). Autocorrelation functions and characteristic times for the -relaxation, which are determined using light intensities scattered from the CF layer, directly indicate thermal melting and curing stages in the process. It is confirmed that MSDWS is a reliable non-contact measurement tool for quantitatively analyzing the initial change of the CF layer during the baking process.

키워드

Autocorrelation function; Color filter; Characteristic relaxation time; Multi-speckle diffusing wave spectroscopy; Particle dynamics; COLLOIDAL SUSPENSIONS; THICK PHOTORESIST; RELAXATION; TECHNOLOGY
제목
Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy
저자
Park, Baek Sung; Hyung, Kyung Hee; Oh, Gwi Jeong; Jung, Hyun Wook
DOI
10.1002/ceat.201700147
발행일
2017-12
유형
Article
저널명
Chemical Engineering and Technology
권
40
호
12
페이지
2230 ~ 2237