Controllable and air-stable graphene n-type doping on phosphosilicate glass for intrinsic graphene

  • Park, Hyung-Youl; 
  • Yoon, Jin-Sang; 
  • Jeon, Jeaho; 
  • Kim, Jinok; 
  • Jo, Seo-Hyeon; 
  • ... Yu, Hyun-Yong; 
  • 외 2명
Citations

WEB OF SCIENCE

11
Citations

SCOPUS

12

초록

We proposed and investigated a controllable air-stable graphene n-doping method on phosphosilicate glass (PSG) to achieve intrinsic graphene. Through Raman, XPS, and AFM analyses, it was confirmed that the initially p-type doped graphene was recovered to intrinsic graphene through n-type doping phenomenon. The n-doping control was accomplished by adjusting the concentration of the out-diffused P2O5 molecules from the PSG layer. In particular, a larger amount of P2O5 molecules and a smoother PSG surface were achieved after the higher temperature annealing, consequently yielding a larger doping impact on the graphene layer. Finally, a very small Dirac point shift (1-3 V) was observed after 96 h of air exposure, compared to the degree of shift by the n-doping effect (17-36 V), demonstrating that this n-doping method is fairly stable in air. (C) 2015 Elsevier B.V. All rights reserved.

키워드

CHEMICAL-VAPOR-DEPOSITION; HEXAGONAL BORON-NITRIDE; DIRAC POINT; LARGE-SCALE; FILMS; TRANSISTOR; TRANSPORT
제목
Controllable and air-stable graphene n-type doping on phosphosilicate glass for intrinsic graphene
저자
Park, Hyung-Youl; Yoon, Jin-Sang; Jeon, Jeaho; Kim, Jinok; Jo, Seo-Hyeon; Yu, Hyun-Yong; Lee, Sungjoo; Park, Jin-Hong
DOI
10.1016/j.orgel.2015.03.039
발행일
2015-07
유형
Article
저널명
Organic Electronics
권
22
페이지
117 ~ 121