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Subthreshold swing characteristics of nanowire tunneling FETs with variation in gate coverage and channel diameter
- Kim, Minsuk;
- Jeon, Youngin;
- Kim, Yoonjoong;
- Kim, Sangsig
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9초록
In this study, we demonstrate the simulated subthreshold swing (SS) of silicon nanowire tunneling field-effect transistors (NWTFETs) by varying both the channel diameter from 10 nm to 40 nm and the gate coverage ratio from 30% to 100%. Our simulation work reveals that both a decrease in the channel diameter and an increase in the gate coverage ratio contribute to a reduction in the SS. Additionally, our work shows that the magnitude of the on-current depends linearly on the gate coverage ratio and that the drain current increases with a decrease in the channel diameter. Thus, an NWTFET with a channel diameter of 10 nm and a gate coverage ratio of 100% exhibits superior electrical characteristics over other silicon NWTFETs in that the NWTFET shows a point SS of 22.7 mV/dec, an average SS of 56.3 mV/dec, an on/off current ratio of similar to 10(13), and an on-current of similar to 10(-5) A/mu m. (C) 2015 Elsevier B.V. All rights reserved.
키워드
- 제목
- Subthreshold swing characteristics of nanowire tunneling FETs with variation in gate coverage and channel diameter
- 저자
- Kim, Minsuk; Jeon, Youngin; Kim, Yoonjoong; Kim, Sangsig
- 발행일
- 2015-07
- 유형
- Article
- 권
- 15
- 호
- 7
- 페이지
- 780 ~ 783
- 언어
- ENG
- 출판사
- ELSEVIER
- 발행국가
- 네덜란드
- 분량
- 4 페이지
- ISSN
- E 1878-1675
P 1567-1739