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초록
Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000-1450 degrees C. Oxidation rate of NbSi2 coating increased with temperature at 1000-1300 degrees C but opposite trend was observed at 1300-1450 degrees C. Maximum oxidation rate was obtained at 1300 degrees C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 degrees C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.
키워드
Intermetallics; SEM; TEM; XRD; Oxidation; IN-SITU COMPOSITES; PACK CEMENTATION TECHNIQUE; SILICIDE-BASED COMPOSITES; MECHANICAL-BEHAVIOR; NIOBIUM DISILICIDE; SUICIDE COATINGS; SINGLE-CRYSTALS; NB; RESISTANCE; ALLOY
- 제목
- High temperature isothermal oxidation behavior of NbSi2 coating at 1000-1450 degrees C
- 저자
- Choi, Young-Jun; Yoon, Jin-Kook; Kim, Gyeung-Ho; Yoon, Woo-Young; Doh, Jung-Man; Hong, Kyung-Tae
- 발행일
- 2017-12
- 유형
- Article
- 권
- 129
- 페이지
- 102 ~ 114