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Development of higher performance indium tin oxide films at a very low temperature (< 80 degrees C) by the neutral beam-assisted sputtering process
- Jang, Jin Nyoung;
- Lee, You Jong;
- Lee, Jun Young;
- Jang, Yun Sung;
- Hong, MunPyo;
- 외 5명
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12초록
At very low temperatures (<80 degrees C), improved performance indium tin oxide (ITO) thin films with a low resistivity of 4.22 x 10(-4) Omega cm and high transmittance >90% at 550 nm were developed using the neutral beam-assisted sputtering (NBAS) technique, which included a cyclic inter-treatment process with an Ar neutral beam. Transmission electron microscopy and electron diffraction showed that the neutral particles with hyper-thermal energy was able to enhance the formation of the nano-crystalline phase and activate the dopant without additional heating or plasma damage during ITO thin film deposition. (C) 2010 Elsevier B.V. All rights reserved.
키워드
Neutral beam assisted deposition; Indium tin oxide; Low temperature deposition; Sputtering; Nano crystalline; PULSED-LASER DEPOSITION; THIN-FILMS; OPTICAL-PROPERTIES; METAL-SURFACES; PLASMA; IONS
- 제목
- Development of higher performance indium tin oxide films at a very low temperature (< 80 degrees C) by the neutral beam-assisted sputtering process
- 저자
- Jang, Jin Nyoung; Lee, You Jong; Lee, Jun Young; Jang, Yun Sung; Hong, MunPyo; Oh, Kyoung Suk; Yoo, Suk Jae; Kim, Daechul; Lee, Bonju; Jang, Won-Gun
- 발행일
- 2011-01-31
- 유형
- Article
- 저널명
- Thin Solid Films
- 권
- 519
- 호
- 7
- 페이지
- 2098 ~ 2102