Enhancement of the Light-Extraction Efficiency of GaN-Based Light Emitting Diodes Using Graded-Refractive-Index Layer by SiO2 Nanosphere Lithography

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초록

A benzocyclobutene (BCB)-based graded-refractive-index (GRIN) layer was deposited on gallium nitride (GaN)-based blue light-emitting diodes (LEDs) to enhance the light-extraction efficiency. The GRIN layer, which was composed of both a BCB thin film and a porous structure, was fabricated by nanospheres lithography using SiO2 nanospheres. The refractive index of the porous BCB layer was intentionally controlled to reduce the total internal reflection of GaN-based LEDs. The refractive indexes of the BCB layer and porous BCB layer were 1.58 and 1.2, respectively. Consequently, the photoluminescence intensity was enhanced 1.6 times after employing the GRIN BCB layer on the GaN layer, and the electroluminescence intensity at a 10 mA injection current was increased by 22% after employing the GRIN BCB layer on an indium tin oxide layer.

키워드

gallium compounds; III-V semiconductors; light emitting diodes; nanolithography; refractive index; silicon compounds; wide band gap semiconductors; POWER
제목
Enhancement of the Light-Extraction Efficiency of GaN-Based Light Emitting Diodes Using Graded-Refractive-Index Layer by SiO2 Nanosphere Lithography
저자
Kim, Byung-Jae; Bang, Joona; Kim, Sung Hyun; Kim, Jihyun
DOI
10.1149/1.3299327
발행일
2010
유형
Article
저널명
Journal of the Electrochemical Society
권
157
호
4
페이지
H449 ~ H451