Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl(2)/X (X = Ar, He, N(2)) Inductively Coupled Plasmas

  • Efremov, Alexander
  • Min, Nam-Ki
  • Choi, Bok-Gil
  • Baek, Kyu-Ha
  • Kwon, Kwang-Ho
Citations

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67
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73

초록

This work reports the influence of gas mixing ratio on the Cl(2)/Ar, Cl(2)/He, and Cl(2)/N(2) plasma parameters, steady-state densities, and fluxes of active species in the planar inductively coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probes and quadrupole mass spectroscopy with a global (zero-dimensional) plasma model. It was shown that the dilution of Cl(2) by any additive gas results in a noticeable change in both the electron temperature and density, as well as provides the acceleration in the electron impact dissociation kinetics of Cl(2) molecules. No qualitative differences for the given three systems in regard to relative changes in active species densities and model-predicted etch rate behaviors were obtained. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.2993160] All rights reserved.

키워드

Active species kineticsPlasma parameterICPCONSISTENT GLOBAL-MODELMODULATED HIGH-DENSITYCHLORINE PLASMASTHIN-FILMSELECTRON TEMPERATURESSURFACE KINETICSCL-2-AR PLASMASDIAGNOSTICSDISCHARGESPOLYSILICON
제목
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl(2)/X (X = Ar, He, N(2)) Inductively Coupled Plasmas
저자
Efremov, AlexanderMin, Nam-KiChoi, Bok-GilBaek, Kyu-HaKwon, Kwang-Ho
DOI
10.1149/1.2993160
발행일
2008
유형
Article
저널명
Journal of the Electrochemical Society
155
12
페이지
D777 ~ D782