ScholarWorks@고려대학교

상세 보기

Etching Mechanism of ZnO films using Inductively Coupled HBr/Ar Plasma

  • Kwon, Kwang-Ho
제목
Etching Mechanism of ZnO films using Inductively Coupled HBr/Ar Plasma
저자
Kwon, Kwang-Ho
학회명
1st International Conference on Microelectronics and plasma Technology
개최국가
대한민국
학회 개최일
2008-08-18 ~ 2008-08-20

ScholarWorks@고려대학교

02841 서울특별시 성북구 안암로 145 Tel. 02-3290-2963

COPYRIGHT © 고려대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.