항생제 내성 제어를 위한 소독 기법간의 비교 ; 염소, 오존 및 전자빔

The Comparison of Disinfection Technologies for Managing Antibiotic Resistance ; Chlrorination, Ozonation and Electron Beam

초록

Recently, a number of countries are now considering the reuse of effluents from wastewater treatment for various water applications. To improve the reuse of wastewater effluent, the development of appropriate micro-pollutant removal technology is necessary. Although several researche have been studied for removing micro-pollutants in water, little study has been conducted for the removal of emerging contaminant such as antibiotic resistant genes (ARGs) by disinfection processes. Therefore, the aim of this study is to compare the capacity of disinfection technologies such as chlorination, ozone, and electron beam, for removing antibiotic resistant bacteria (ARB) and ARGs. Based on this study, better ARG removal can be achieved by ozonation and electron beam. Relatively, high CT values of chlorination or ozonation are needed to remove ARB and ARG compared to conventional pathogens.

키워드

Antibiotic Resistant Gene (ARG)pB10 plasmidChlorinationElectron beamOzonation
제목
항생제 내성 제어를 위한 소독 기법간의 비교 ; 염소, 오존 및 전자빔
제목 (타언어)
The Comparison of Disinfection Technologies for Managing Antibiotic Resistance ; Chlrorination, Ozonation and Electron Beam
저자
오준식김성표
발행일
2013
저널명
상하수도학회지
27
6
페이지
797 ~ 803