Interface Trap Density of Gate-All-Around Silicon Nanowire Field-Effect Transistors With TiN Gate: Extraction and Compact Model

초록

Si/SiO2 interface trap charge distribution of cylindrical cross-sectioned gate-all-around silicon nanowire field-effect transistor is extracted by using three-dimensional simulation. While the interface chemistry of conventional gatestack (Si/SiO2 polysilicon) in conventional planar devices is well documented, not much work is available on interface trap distribution D-it of alternate gatestacks (gatestacks employing alternate gate materials) in silicon nanowire MOSFET devices. Furthermore, a compact drain current model with interface trap charge parameter is presented. The model is based on gradual channel approximation and uses self-consistent calculation of interface trap charge and surface potential to reproduce experimental current-voltage characteristics.

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