Fabrication of Superhydrophobic and Oleophobic Surfaces with Overhang Structure by Reverse Nanoimprint Lithography

  • Choi, Hak-Jong; 
  • Choo, Soyoung; 
  • Shin, Ju-Hyeon; 
  • Kim, Kang-In; 
  • Lee, Heon
Citations

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162
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180

초록

This work reports the fabrication of superhydrophobic and oleophobic surfaces with an overhang structure by reverse nanoimprint lithography. An overhang structure is difficult to fabricate by conventional lithography; however, it was conveniently formed by reverse imprint lithography, employed in conjunction with reactive ion etching. The obtained overhang structure was coated with a fluoroalkylsilane monolayer to reduce its surface energy. Further, four different types of nanopatterns were separately embedded on the surface of the obtained overhang structure by modified reverse imprint lithography to enhance its oil-repelling properties. The embedded nanopatterns resulted in different overhang angles, thereby enhancing the oil-repelling properties. The morphology and wetting characteristics of the overhang structure were investigated by scanning electron microscopy and contact angle measurements. This study demonstrates that an overhang structure can be successfully fabricated on a substrate by reverse nanoimprint lithography; moreover, oleophobic structures can be realized using materials with contact angles <90 degrees

키워드

SELF-ASSEMBLED MONOLAYER; SUPER-WATER-REPELLENT; RESISTANCE; MUSHROOM; DESIGN
제목
Fabrication of Superhydrophobic and Oleophobic Surfaces with Overhang Structure by Reverse Nanoimprint Lithography
저자
Choi, Hak-Jong; Choo, Soyoung; Shin, Ju-Hyeon; Kim, Kang-In; Lee, Heon
DOI
10.1021/jp4070399
발행일
2013-11-21
유형
Article
저널명
The Journal of Physical Chemistry C
권
117
호
46
페이지
24354 ~ 24359