Fabrication of Cr2O3 Nano-to-Microscale Structures Using UV Nanoimprint Lithography

초록

The chromium sesquioxide (Cr2O3) materials are great interest due to variety of potential advantages such as electronic, optical, and magnetic properties. To obtain more effectiveness, the Cr2O3 nano-to-microscale structures were successfully fabricated using Cr2O3 nanoparticle resin and UV nanoimprint lithography (NIL). Using this technology, we confirmed that imprinting is possible not only on traditional rigid substrates but also on flexible substrates. The crystallinity of the Cr2O3 resin was determined by heat treatment and confirmed by X-ray diffraction analysis. Moreover, the optical properties of the nano-to-micro Cr2O3 structures were analyzed using UV-visible spectrophotometry.

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