Origin of Dark Current Robustness in Photomultiplication Organic Photodetectors Enabled by Ionic Conjugated Electron-Blocking Layers

  • Kang, Yelim; 
  • Jee, Min Hun; 
  • Zhang, Shuai; 
  • Lee, Sang Heon; 
  • Ha, Jung Min; 
  • ... Shim, Jae Won; 
  • 외 7명
Citations

SCOPUS

4

초록

Photomultiplication-type organic photodetectors (PM OPDs), which rely on signal amplification via electron trapping, suffer from a fundamental trade-off: high gain is typically accompanied by a steep increase in dark current under high reverse bias. Here, we overcome this challenge by employing ionic conjugated polyelectrolyte (CPE)-based electron blocking layers (EBLs) with an alternating fluorene-co-triphenylamine backbone. CPE-based EBLs in PM OPDs enable robust dark current stability under reverse bias up to −10 V while maintaining external quantum efficiencies (EQE) exceeding 2000%. Charge-dynamics analysis using Fowler–Nordheim plots reveals that a nanometer-thick CPE layer provides electron-blocking performance comparable to that of a ∼20 nm Al2O3 layer. At the same time, we show that the nature of the ionic side chains (cationic vs anionic) in CPEs governs interfacial energy-level alignment, thereby modulating hole selectivity and photocarrier dynamics. The design principles establish a general framework for interfacial and field engineering across a broad range of photodetector platforms—from organic to hybrid systems—guiding the development of next-generation photodetectors. © 2026 The Author(s). Advanced Materials published by Wiley-VCH GmbH.

키워드

charge dynamics; conjugated polyelectrolyte; dark current robustness; electron blocking layer; electron selective insulating; interfacial dipole; photomultiplication organic photodetector
제목
Origin of Dark Current Robustness in Photomultiplication Organic Photodetectors Enabled by Ionic Conjugated Electron-Blocking Layers
저자
Kang, Yelim; Jee, Min Hun; Zhang, Shuai; Lee, Sang Heon; Ha, Jung Min; Zhao, Xingchao; Ma, Xiaoling; Shin, Huiseong; Shin, Changhwan; Lee, Soonyong; Zhang, Fujun; Shim, Jae Won; Woo, Han Young
DOI
10.1002/adma.74371
발행일
2026-09-21
유형
Article
저널명
Advanced Materials
권
38
호
53