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A Model-Based Analysis of Plasma Parameters and Composition in HBr/X (X=Ar, He, N-2) Inductively Coupled Plasmas
- Kwon, Kwang-Ho;
- Efremov, Alexander;
- Kim, Moonkeun;
- Min, Nam Ki;
- Jeong, Jaehwa;
- 외 1명
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48초록
This work discusses the effect of gas mixing ratio on the HBr/X (X=Ar, He, or N-2) plasma parameters, steady-state densities, and fluxes of active species in the planar inductively coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probes and a global (zero-dimensional) plasma model with Maxwellian approximation for the electron energy distribution function. The dilution of HBr by Ar results in a maximum effect on the HBr electron impact dissociation kinetics and provides a favorable condition for an ion-assisted chemical reaction.
키워드
argon; electron impact dissociation; gas mixtures; helium; hydrogen compounds; Langmuir probes; nitrogen; plasma chemistry; plasma density; plasma simulation; reaction kinetics theory; ELECTRON-ENERGY DISTRIBUTION; ACTIVE SPECIES KINETICS; MODULATED HIGH-DENSITY; GLOBAL-MODEL; SURFACE KINETICS; DISCHARGES; BROMINE; AR; RECOMBINATION; POLYSILICON
- 제목
- A Model-Based Analysis of Plasma Parameters and Composition in HBr/X (X=Ar, He, N-2) Inductively Coupled Plasmas
- 저자
- Kwon, Kwang-Ho; Efremov, Alexander; Kim, Moonkeun; Min, Nam Ki; Jeong, Jaehwa; Kim, Kwangsoo
- 발행일
- 2010
- 유형
- Article
- 권
- 157
- 호
- 5
- 페이지
- H574 ~ H579
- 언어
- ENG
- 출판사
- ELECTROCHEMICAL SOC INC
- 발행국가
- 미국
- ISSN
- E 1945-7111
P 0013-4651