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The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2
The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2
- 제목
- The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2
- 제목 (타언어)
- The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2
- 저자
- BYUN, Dong Jin
- 발행일
- 2013-07-02
- 학회명
- The 16th International Symposium on the Physics of Semiconductors and Applications
- 개최국가
- 대한민국
- 학회 개최일
- 2013-07-02 ~ 2013-07-05