상세 보기
International Journal of Applied Electromagnetics and Mechanics
ISSN
P 1383-5416 E 1875-8800
출판사
IOS Press
국가
NETHERLANDS
발행 상태
활성
데이터베이스 수록 정보
CiteScore 2011-2025 (15년)
JCR 1998-2025 (28년)
SCIE 2010-2026 (17년)
Scopus 1996-2026 (31년)
SJR 1999-2020, 2022-2025 (26년)
전체 11건 중 1번부터 10번까지의 결과를 표시합니다.
2023
Article
Deterministically-grown GaN microrods on a mask-free plateau patterned substrate
- Ahn, Min Joo ;
- Shim, Kyu-yeon ;
- Jeong, Woo Seop ;
- Kang, Seongho ;
- Kim, Hwayoung ;
- ... Byun, Dongjin ;
- 외 3명
- 2023-01-01
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
2022
Article
On mechanisms influencing etching/polymerization balance in multi-component fluorocarbon gas mixtures
- Efremov, Alexander ;
- Son, Hye Jun ;
- Choi, Gilyoung ;
- Kwon, Kwang-Ho
- 2022-12
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
2021
Article
Comparative study of Cl2 + O2 and HBr + O2 plasma chemistries in respect to silicon reactive-ion etching process
- Lim, N. ;
- Efremov, A. ;
- Kwon, K.-H.
- 2021-04
- Vacuum
- Elsevier Ltd
Article
Effect of thermal annealing on the properties of ZnO thin films
- Lim, Weon Cheol ;
- Singh, Jitendra Pal ;
- Kim, Younghak ;
- Song, Jonghan ;
- Chae, Keun Hwa ;
- 외 1명
- 2021-01
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
2019
Article
Combined effects of oxygen pressures and RF powers on the electrical characteristics of ITO-based multilayer transparent electrodes
- Im, Hyeong-Seop ;
- Kim, Su-Kyung ;
- Lee, Tae-Ju ;
- Seong, Tae-Yeon
- 2019-11
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
Article
Abnormal characteristics of etched profile on thick dielectrics for MEMS in inductively coupled plasma
- Lim, Nomin ;
- Han, Il Ki ;
- Kim, Young-Hwan ;
- Lee, Hyun Woo ;
- Cho, Yunsung ;
- 외 3명
- 2019-08
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
Article
Fabrication of nanoporous thin films via radio-frequency magnetron sputtering and O-2 plasma ashing
- Jang, Seong Woo ;
- Hwang, Sehoon ;
- Lim, Sang Ho ;
- Han, Seunghee
- 2019-05
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
Article
Plasma parameters, gas-phase chemistry and Si/SiO2 etching mechanisms in HBr + Cl-2 + O-2 gas mixture: Effect of HBr/O-2 mixing ratio
- Lee, Byung Jun ;
- Efremov, Alexander ;
- Kwon, Kwang-Ho
- 2019-05
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
2018
Article
On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios
- Lee, Jaemin ;
- Efremov, Alexander ;
- Kwon, Kwang-Ho
- 2018-02
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
2011
Article
Etching characteristics and mechanism of Ga-doped ZnO thin films in inductively-coupled HBr/X (X = Ar, He, N-2, O-2) plasmas
- Ham, Y. -H. ;
- Efremov, A. ;
- Lee, H. W. ;
- Yun, S. J. ;
- Min, N. K. ;
- 외 3명
- 2011-04-15
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
1