ScholarWorks@Korea University

Izvestiya Vysshikh Uchebnykh Zavedenii, Seriya Khimiya i Khimicheskaya Tekhnologiya

Journal Title

  • Izvestiya Vysshikh Uchebnykh Zavedenii, Seriya Khimiya i Khimicheskaya Tekhnologiya

ISSN

  • E 2500-3070 | P 0579-2991 | 0579-2991 | 2500-3070

Publisher

  • Ivanovo State University of Chemistry and Technology

Listed on(Coverage)

SJR2019
CiteScore2019
SCOPUS2019-2020

Active

  • Active

    based on the information

    • SCOPUS:2020-10

Country

  • RUSSIA

Article List

1 - 4 out of 4 results.

SCOPUS
PLASMA PARAMETERS AND SiO2 ETCHING KINETICS IN C4F8

Efremov, A. M.; Betelin, V. B.; Kwon, K. -H.

ArticleIssue Date2020CitationIZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, v.63, no.6, pp.37 - 43PublisherIVANOVSKOGO KHIMIKO-TEKHNOLOGI TSHESKOGO INST
SCOPUS
FEATURES OF SiO2 REACTIVE-ION ETCHING KINETICS IN CF4

Efremov, Alexander M.; Sobolev, Alexander M.; Kwon, Kwang-Ho

ArticleIssue Date2020CitationIZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, v.63, no.9, pp.21 - 27PublisherIVANOVSKOGO KHIMIKO-TEKHNOLOGI TSHESKOGO INST
SCOPUS
PLASMA PARAMETERS AND KINETICS OF ACTIVE SPECIES IN HBr

Efremov, Aleksandr M.; Betelin, Vladimir B.; Kwon, Kwang-Ho; Snegirev, Dmitriy G.

ArticleIssue Date2019CitationIZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, v.62, no.7, pp.72 - 79PublisherIVANOVSKOGO KHIMIKO-TEKHNOLOGI TSHESKOGO INST
SCOPUS
PLASMA PARAMETERS AND COMPOSITION IN CF4/O-2/Ar GAS MIXTURE

Efremov, A. M.; Kwon, K. -H.

ArticleIssue Date2017CitationIZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, v.60, no.1, pp.50 - 55PublisherIVANOVSKOGO KHIMIKO-TEKHNOLOGI TSHESKOGO INST
1
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