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Journal of Endocrinological Investigation
ISSN
P 0391-4097 E 1720-8386
출판사
Editrice Kurtis srl
국가
USA
발행 상태
활성
데이터베이스 수록 정보
CiteScore 2011-2025 (15년)
EMBASE 2016-2026 (11년)
JCR 1997-2025 (29년)
MEDLINE 2016-2024 (9년)
SCI 2010-2019 (10년)
SCIE 2010-2026 (17년)
Scopus 1978-2026 (49년)
SJR 1999-2020, 2022-2025 (26년)
전체 15건 중 1번부터 10번까지의 결과를 표시합니다.
2023
Article
Individual Effects of Various Plasma-Related Factors on the High Aspect Ratio Oxide Etching Process at Low-Frequency Bias Power Using an Inductively Coupled Plasma System
- Son, Hye Jun ;
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- 2023-08-08
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2021
Article
A Comparison of CF4, CHF3 and C4F8 + Ar/O-2 Inductively Coupled Plasmas for Dry Etching Applications
- Lim, Nomin ;
- Efremov, Alexander ;
- Kwon, Kwang-Ho
- 2021-11
- Plasma Chemistry and Plasma Processing
- SPRINGER
2020
Article
Plasma Parameters and Silicon Etching Kinetics in C4F8 + O-2 + Ar Gas Mixture: Effect of Component Mixing Ratios
- Lee, Byung Jun ;
- Efremov, Alexander ;
- Nam, Yunho ;
- Kwon, Kwang-Ho
- 2020-09
- Plasma Chemistry and Plasma Processing
- SPRINGER
Article
Etching Kinetics and Surface Conditions for KNbxOy Thin Films with Fluorine- and Chlorine-Based Plasma Chemistries
- Lim, Nomin ;
- Efremov, Alexander ;
- Hwang, Hyun-Gyu ;
- Nahm, Sahn ;
- Kwon, Kwang-Ho
- 2020-03
- Plasma Chemistry and Plasma Processing
- SPRINGER
2019
Article
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O-2 Inductively Coupled Plasma
- Lee, Junmyung ;
- Kim, Jihun ;
- Efremov, Alexander ;
- Kim, Changmok ;
- Lee, Hyun Woo ;
- 외 1명
- 2019-07
- Plasma Chemistry and Plasma Processing
- SPRINGER
Article
Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl- and Br-Based Plasma Chemistries
- Lee, Byung Jun ;
- Efremov, Alexander ;
- Lee, Junmyung ;
- Kwon, Kwang-Ho
- 2019-01
- Plasma Chemistry and Plasma Processing
- SPRINGER
Article
Peculiarities of Si and SiO2 Etching Kinetics in HBr+Cl-2+O-2 Inductively Coupled Plasma
- Lee, Byung Jun ;
- Efremov, Alexander ;
- Kim, Jihun ;
- Kim, Changmok ;
- Kwon, Kwang-Ho
- 2019-01
- Plasma Chemistry and Plasma Processing
- SPRINGER
2018
Article
Hemoglobin as a Diagnosing Molecule for Biological Effects of Atmospheric-Pressure Plasma
- Ki, Se Hoon ;
- Sin, Somin ;
- Shin, Jae-Ho ;
- Kwon, Young Wan ;
- Chae, Myoung Won ;
- 외 3명
- 2018-09
- Plasma Chemistry and Plasma Processing
- SPRINGER
2017
Article
On the Etching Mechanisms of SiC Thin Films in CF4/CH2F2/N-2/Ar Inductively Coupled Plasma
- Lee, Jongchan ;
- Efremov, Alexander ;
- Kim, Kwangsoo ;
- Kwon, Kwang-Ho
- 2017-03
- Plasma Chemistry and Plasma Processing
- SPRINGER
2016
Article
Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl-2 + Ar and HBr plus Ar Inductively Coupled Plasmas
- Lee, Junmyung ;
- Efremov, Alexander ;
- Lee, Byung Jun ;
- Kwon, Kwang-Ho
- 2016-11
- Plasma Chemistry and Plasma Processing
- SPRINGER
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