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Etching characteristics of Al2O3 thin films in inductively coupled BCl3/Ar plasma

Yun, Sun Jin; Efremov, Alexander; Kim, Mansu; Kim, Dae-Won; Lim, Jung Wook; Kim, Yong-Hae; Chung, Choong-Heui; Park, Dong Jin; Kwon, Kwang-Ho

ArticleIssue Date2008CitationVACUUM, v.82, no.11, pp 1198 - 1202PublisherPERGAMON-ELSEVIER SCIENCE LTD
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