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SCIESCOPUS
Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Bang, Joona; Jeong, Unyong; Ryu, Du Yeol; Russell, Thomas P.; Hawker, Craig J.

ArticleIssue Date2009CitationADVANCED MATERIALS, v.21, no.47, pp 4769 - 4792PublisherWILEY-V C H VERLAG GMBH
SCISCIESCOPUS
Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns

Choi, Jaewon; Huh, June; Carter, Kenneth R.; Russell, Thomas P.

ArticleIssue Date2016CitationACS NANO, v.10, no.8, pp 7915 - 7925PublisherAMER CHEMICAL SOC
SCISCIESCOPUS
Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

Choi, Jaewon; Li, Yinyong; Kim, Paul Y.; Liu, Feng; Kim, Hyeyoung; Yu, Duk Man; Huh, June; Carter, Kenneth R.; Russell, Thomas P.

ArticleIssue Date2018CitationACS APPLIED MATERIALS & INTERFACES, v.10, no.9, pp 8324 - 8332PublisherAMER CHEMICAL SOC
SCIESCOPUS
Repairable Macroscopic Monodomain Arrays from Block Copolymers Enabled by Photoplastic and Photodielectric Effects

Jeon, Hui Il; Jo, Seungyun; Jeon, Seungbae; Jun, Taesuk; Moon, Jungwoo; Cho, Jeong Ho; Ahn, Hyungju; Lee, Seungwoo; Ryu, Du Yeol; Russell, Thomas P.

ArticleIssue Date2023CitationACS NANO, v.17, no.9, pp 8367 - 8375PublisherAMER CHEMICAL SOC
SCIESCOPUS
Size control and registration of nano-structured thin films by cross-linkable units

Kim, Eunhye; Shin, Changhak; Ahn, Hyungju; Ryu, Du Yeol; Bang, Joona; Hawker, Craig J.; Russell, Thomas P.

ArticleIssue Date2008CitationSOFT MATTER, v.4, no.3, pp 475 - 479PublisherROYAL SOC CHEMISTRY
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