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Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
- Issue Date
- 18-12월-2009
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- ADVANCED MATERIALS, v.21, no.47, pp.4769 - 4792
- Indexed
- SCIE
SCOPUS
- Journal Title
- ADVANCED MATERIALS
- Volume
- 21
- Number
- 47
- Start Page
- 4769
- End Page
- 4792
- ISSN
- 0935-9648
- Abstract
- The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.
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