Resistive switching phenomena of tungsten nitride thin films with excellent CMOS compatibility
DC Field | Value | Language |
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dc.contributor.author | Hong, Seok Man | - |
dc.contributor.author | Kim, Hee-Dong | - |
dc.contributor.author | An, Ho-Myoung | - |
dc.contributor.author | Kim, Tae Geun | - |
dc.date.accessioned | 2021-09-05T18:19:51Z | - |
dc.date.available | 2021-09-05T18:19:51Z | - |
dc.date.created | 2021-06-15 | - |
dc.date.issued | 2013-12 | - |
dc.identifier.issn | 0025-5408 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/101420 | - |
dc.description.abstract | We report the resistive switching (RS) characteristics of tungsten nitride (WNx) thin films with excellent complementary metal-oxide-semiconductor (CMOS) compatibility. A Ti/WNx/Pt memory cell clearly shows bipolar RS behaviors at a low voltage of approximately +/- 2.2 V. The dominant conduction mechanisms at low and high resistance states were verified by Ohmic behavior and trap-controlled space-charge-limited conduction, respectively. A conducting filament model by a redox reaction explains the RS behavior in WNx films. We also demonstrate the memory characteristics during pulse operation, including a high endurance over >10(5) cycles and a long retention time of >10(5) s. (C) 2013 Elsevier Ltd. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | PERGAMON-ELSEVIER SCIENCE LTD | - |
dc.title | Resistive switching phenomena of tungsten nitride thin films with excellent CMOS compatibility | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Tae Geun | - |
dc.identifier.doi | 10.1016/j.materresbull.2013.05.073 | - |
dc.identifier.scopusid | 2-s2.0-84885950798 | - |
dc.identifier.wosid | 000327559700024 | - |
dc.identifier.bibliographicCitation | MATERIALS RESEARCH BULLETIN, v.48, no.12, pp.5080 - 5083 | - |
dc.relation.isPartOf | MATERIALS RESEARCH BULLETIN | - |
dc.citation.title | MATERIALS RESEARCH BULLETIN | - |
dc.citation.volume | 48 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 5080 | - |
dc.citation.endPage | 5083 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.subject.keywordAuthor | thin films | - |
dc.subject.keywordAuthor | Sputtering | - |
dc.subject.keywordAuthor | X-ray diffraction | - |
dc.subject.keywordAuthor | Electrical properties | - |
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