Degradation and modification of stainless-steel surface using Cl-2/Ar inductively coupled plasma
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jang, Hanbyeol | - |
dc.contributor.author | Efremov, Alexander | - |
dc.contributor.author | Yun, Sun Jin | - |
dc.contributor.author | Yeom, Geun Young | - |
dc.contributor.author | Kim, Kyoung Bo | - |
dc.contributor.author | Kwon, Kwang-Ho | - |
dc.date.accessioned | 2021-09-05T22:42:46Z | - |
dc.date.available | 2021-09-05T22:42:46Z | - |
dc.date.created | 2021-06-14 | - |
dc.date.issued | 2013-08-15 | - |
dc.identifier.issn | 0169-4332 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/102441 | - |
dc.description.abstract | The investigations of stainless steel (SS) etching behavior in the Cl-2/Ar inductively coupled plasma as well as the etched surface characteristics were carried out. It was found that an increase in Ar fraction in the Cl-2/Ar plasma from 0 to 100% at fixed gas pressure, input power and bias power results in decreasing both etching (degradation) rate of the SS surface (41.3-1.5 nm/min) and mean SS surface roughness (84-20 nm). Plasma diagnostics by Langmuir probes and 0-dimensional plasma modeling provided the data on plasma parameters, steady-state densities and fluxes of active species on the etched surface. It was shown that the maximum changes in mean roughness as well as in both polar and dispersive components of free surface energy correspond to a maximum value of Cl atom flux/ion flux ratio. Also, the linear correlation between free surface energy and mean roughness was obtained. (C) 2013 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | MODEL-BASED ANALYSIS | - |
dc.subject | GLOBAL-MODEL | - |
dc.subject | HIGH-DENSITY | - |
dc.subject | PARAMETERS | - |
dc.subject | DISCHARGES | - |
dc.subject | AR | - |
dc.subject | HE | - |
dc.title | Degradation and modification of stainless-steel surface using Cl-2/Ar inductively coupled plasma | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kwon, Kwang-Ho | - |
dc.identifier.doi | 10.1016/j.apsusc.2013.03.175 | - |
dc.identifier.scopusid | 2-s2.0-84878615890 | - |
dc.identifier.wosid | 000320766500007 | - |
dc.identifier.bibliographicCitation | APPLIED SURFACE SCIENCE, v.279, pp.41 - 45 | - |
dc.relation.isPartOf | APPLIED SURFACE SCIENCE | - |
dc.citation.title | APPLIED SURFACE SCIENCE | - |
dc.citation.volume | 279 | - |
dc.citation.startPage | 41 | - |
dc.citation.endPage | 45 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | MODEL-BASED ANALYSIS | - |
dc.subject.keywordPlus | GLOBAL-MODEL | - |
dc.subject.keywordPlus | HIGH-DENSITY | - |
dc.subject.keywordPlus | PARAMETERS | - |
dc.subject.keywordPlus | DISCHARGES | - |
dc.subject.keywordPlus | AR | - |
dc.subject.keywordPlus | HE | - |
dc.subject.keywordAuthor | Stainless-steel | - |
dc.subject.keywordAuthor | Cl-2/Ar plasma | - |
dc.subject.keywordAuthor | Etching | - |
dc.subject.keywordAuthor | Modification | - |
dc.subject.keywordAuthor | Roughness | - |
dc.subject.keywordAuthor | Free surface energy | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.