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Fabrication of highly transparent self-cleaning protection films for photovoltaic systems

Authors
Lee, Seong-HwanHan, Kang-SooShin, Ju-HyeonHwang, Seon-YongLee, Heon
Issue Date
Aug-2013
Publisher
WILEY-BLACKWELL
Keywords
solar cell; anti-reflection; nano-pattern; UV nanoimprint; hot-embossing; moth-eye pattern; superhydrophobicity; external quantum efficiency
Citation
PROGRESS IN PHOTOVOLTAICS, v.21, no.5, pp.1056 - 1062
Indexed
SCIE
SCOPUS
Journal Title
PROGRESS IN PHOTOVOLTAICS
Volume
21
Number
5
Start Page
1056
End Page
1062
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/102625
DOI
10.1002/pip.2203
ISSN
1062-7995
Abstract
A moth-eye anti-reflective structure was fabricated by hot-embossing and UV nanoimprint lithography on a solar cell protective film to suppress the reflection of incident light. Moreover, a superhydrophobic surface was developed by reducing the surface energy by forming a hydrophobic self-assembled monolayer coating on an anti-reflective structured resin surface. Therefore, the transmittance of incident light was increased by the anti-reflective structure. As a result, the solar cell efficiency was enhanced and the total accumulated electrical energy generated by a solar cell with a nano-patterned polymeric film was increased. The efficiency of each solar cell was evaluated by an analysis of its I-V characteristics using a solar simulator, and the external quantum efficiency according to the wavelength of incident light was analyzed by using an incident photon-to-current conversion efficiency system. Finally, the enhancement of the generated power was confirmed by a field test and a power charging experiment. Copyright (c) 2012 John Wiley & Sons, Ltd.
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