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Effects of rapid thermal annealing on electrical, optical, and structural properties of Ni-doped In2O3 anodes for bulk heterojunction organic solar cells

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dc.contributor.authorKim, Jun Ho-
dc.contributor.authorSeong, Tae-Yeon-
dc.contributor.authorKim, Han-Ki-
dc.date.accessioned2021-09-06T03:59:17Z-
dc.date.available2021-09-06T03:59:17Z-
dc.date.created2021-06-14-
dc.date.issued2013-03-
dc.identifier.issn0734-2101-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/103868-
dc.description.abstractThe authors investigated the effects of rapid thermal annealing (RTA) on the electrical, optical, and structural properties, and work functions of Ni-doped In2O3 (INO) anodes prepared by a DC/RF co-sputtering process for use in bulk heterojunction organic solar cells (OSCs). By RTA processing at 600 degrees C, the authors obtained the optimized INO anodes with a sheet resistance of 28 Omega/sq, an optical transmittance of 82.93%, and a work function of 5.02 eV, which are acceptable in OSC fabrication. In particular, the 600 degrees C annealed INO anode showed much higher optical transmittance in the near infrared wavelength region than the conventional ITO film, even though it had a low resistivity of 5.66 x 10(-4) Omega cm. The OSC fabricated on the annealed INO anode showed a higher power convention efficiency of 2.65% than the OSC with as-deposited INO anodes (2.19%) because the fill factors of the OSC are critically dependent on the sheet resistance of the anode. (C) 2013 American Vacuum Society. [http://dx.doi.org/10.1116/1.4774212]-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectINDIUM TIN OXIDE-
dc.subjectLIGHT-EMITTING DEVICES-
dc.subjectTHIN-FILMS-
dc.subjectSURFACE MODIFICATION-
dc.subjectPYROSOL PROCESS-
dc.subjectTEMPERATURE-
dc.titleEffects of rapid thermal annealing on electrical, optical, and structural properties of Ni-doped In2O3 anodes for bulk heterojunction organic solar cells-
dc.typeArticle-
dc.contributor.affiliatedAuthorSeong, Tae-Yeon-
dc.identifier.doi10.1116/1.4774212-
dc.identifier.scopusid2-s2.0-84874627316-
dc.identifier.wosid000315595700008-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.31, no.2-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.citation.volume31-
dc.citation.number2-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusINDIUM TIN OXIDE-
dc.subject.keywordPlusLIGHT-EMITTING DEVICES-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusSURFACE MODIFICATION-
dc.subject.keywordPlusPYROSOL PROCESS-
dc.subject.keywordPlusTEMPERATURE-
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공과대학 (신소재공학부)
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