Fabrication of 3D nano-structures using reverse imprint lithography
- Authors
- Han, Kang-Soo; Hong, Sung-Hoon; Kim, Kang-In; Cho, Joong-Yeon; Choi, Kyung-woo; Lee, Heon
- Issue Date
- 1-2월-2013
- Publisher
- IOP PUBLISHING LTD
- Citation
- NANOTECHNOLOGY, v.24, no.4
- Indexed
- SCIE
SCOPUS
- Journal Title
- NANOTECHNOLOGY
- Volume
- 24
- Number
- 4
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/103992
- DOI
- 10.1088/0957-4484/24/4/045304
- ISSN
- 0957-4484
- Abstract
- In spite of the fact that the fabrication process of three-dimensional nano-structures is complicated and expensive, it can be applied to a range of devices to increase their efficiency and sensitivity. Simple and inexpensive fabrication of three-dimensional nano-structures is necessary. In this study, reverse imprint lithography (RIL) with UV-curable benzylmethacrylate, methacryloxypropyl terminated poly-dimethylsiloxane (M-PDMS) resin and ZnO-nano-particle-dispersed resin was used to fabricate three-dimensional nano-structures. UV-curable resins were placed between a silicon stamp and a PVA transfer template, followed by a UV curing process. Then, the silicon stamp was detached and a 2D pattern layer was transferred to the substrate using diluted UV-curable glue. Consequently, three-dimensional nano-structures were formed by stacking the two-dimensional nano-patterned layers. RIL was applied to a light-emitting diode (LED) to evaluate the optical effects of a nano-patterned layer. As a result, the light extraction of the patterned LED was increased by about 12% compared to an unpatterned LED.
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Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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