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주사형 탐침 현미경을 이용한 Ru(0001) 위 그래핀의에피탁시얼 성장 조건에 대한 연구Epitaxial Growth of Graphene by Surface Segregation and Chemical Vapor Depositionon Ru(0001) Studied with Scanning Tunneling Microscopy

Other Titles
Epitaxial Growth of Graphene by Surface Segregation and Chemical Vapor Depositionon Ru(0001) Studied with Scanning Tunneling Microscopy
Authors
장원준강세종
Issue Date
2013
Publisher
한국진공학회
Keywords
Graphene; Ru(0001); STM; Epitaxial growth
Citation
Applied Science and Convergence Technology, v.22, no.6, pp.285 - 290
Indexed
KCI
Journal Title
Applied Science and Convergence Technology
Volume
22
Number
6
Start Page
285
End Page
290
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/104958
ISSN
1225-8822
Abstract
Epitaxial graphene on metal substrates provides excellent platforms to study its atomic and electronic structures, and can be grown either by surface segregation of carbon or by chemical vapor deposition. The growth behaviors of the two methods, however, have not been directly compared each other. Here, we studied domain structures of graphene grown by three different methods, surface segregation, post-annealing with adsorbed ethylene, and high-temperature dose of ethylene, using scanning tunneling microscopy. The first two methods resulted in graphene regions with areas of 100 nm2, whereas the third method showed large area graphene (>104 nm2) with regular hexagonal Moiré patterns, implying that high-temperature dose of ethylene is preferable for further studies on graphene such as additional growth of organic molecules.
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