항생제 내성 제어를 위한 소독 기법간의 비교 ; 염소, 오존 및 전자빔The Comparison of Disinfection Technologies for Managing Antibiotic Resistance ; Chlrorination, Ozonation and Electron Beam
- Other Titles
- The Comparison of Disinfection Technologies for Managing Antibiotic Resistance ; Chlrorination, Ozonation and Electron Beam
- Authors
- 오준식; 김성표
- Issue Date
- 2013
- Publisher
- 대한상하수도학회
- Keywords
- Antibiotic Resistant Gene (ARG); pB10 plasmid; Chlorination; Electron beam; Ozonation
- Citation
- 상하수도학회지, v.27, no.6, pp 797 - 803
- Pages
- 7
- Indexed
- KCI
- Journal Title
- 상하수도학회지
- Volume
- 27
- Number
- 6
- Start Page
- 797
- End Page
- 803
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/105269
- ISSN
- 1225-7672
2287-822X
- Abstract
- Recently, a number of countries are now considering the reuse of effluents from wastewater treatment for various water applications. To improve the reuse of wastewater effluent, the development of appropriate micro-pollutant removal technology is necessary. Although several researche have been studied for removing micro-pollutants in water, little study has been conducted for the removal of emerging contaminant such as antibiotic resistant genes (ARGs) by disinfection processes. Therefore, the aim of this study is to compare the capacity of disinfection technologies such as chlorination, ozone, and electron beam, for removing antibiotic resistant bacteria (ARB) and ARGs. Based on this study, better ARG removal can be achieved by ozonation and electron beam. Relatively, high CT values of chlorination or ozonation are needed to remove ARB and ARG compared to conventional pathogens.
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Collections - Graduate School > Department of Environmental Engineering > 1. Journal Articles

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