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항생제 내성 제어를 위한 소독 기법간의 비교 ; 염소, 오존 및 전자빔The Comparison of Disinfection Technologies for Managing Antibiotic Resistance ; Chlrorination, Ozonation and Electron Beam

Other Titles
The Comparison of Disinfection Technologies for Managing Antibiotic Resistance ; Chlrorination, Ozonation and Electron Beam
Authors
오준식김성표
Issue Date
2013
Publisher
대한상하수도학회
Keywords
Antibiotic Resistant Gene (ARG); pB10 plasmid; Chlorination; Electron beam; Ozonation
Citation
상하수도학회지, v.27, no.6, pp.797 - 803
Indexed
KCI
Journal Title
상하수도학회지
Volume
27
Number
6
Start Page
797
End Page
803
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/105269
ISSN
1225-7672
Abstract
Recently, a number of countries are now considering the reuse of effluents from wastewater treatment for various water applications. To improve the reuse of wastewater effluent, the development of appropriate micro-pollutant removal technology is necessary. Although several researche have been studied for removing micro-pollutants in water, little study has been conducted for the removal of emerging contaminant such as antibiotic resistant genes (ARGs) by disinfection processes. Therefore, the aim of this study is to compare the capacity of disinfection technologies such as chlorination, ozone, and electron beam, for removing antibiotic resistant bacteria (ARB) and ARGs. Based on this study, better ARG removal can be achieved by ozonation and electron beam. Relatively, high CT values of chlorination or ozonation are needed to remove ARB and ARG compared to conventional pathogens.
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