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Soft lithography of graphene sheets via surface energy modification

Authors
Kim, HansunJung, Min-wookMyung, SungJung, DaesungLee, Sun SookKong, Ki-jeongLim, JongsunLee, Jong-HeunPark, Chong YunAn, Ki-Seok
Issue Date
2013
Publisher
ROYAL SOC CHEMISTRY
Citation
JOURNAL OF MATERIALS CHEMISTRY C, v.1, no.6, pp.1076 - 1079
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF MATERIALS CHEMISTRY C
Volume
1
Number
6
Start Page
1076
End Page
1079
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/106602
DOI
10.1039/c2tc00472k
ISSN
2050-7526
Abstract
A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.
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