Nanocrystalline GaZnO Films for Transparent Electrode to Silicon Carbide
DC Field | Value | Language |
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dc.contributor.author | Lee, Jungho | - |
dc.contributor.author | Kim, Ji-Hong | - |
dc.contributor.author | Do, Kang-Min | - |
dc.contributor.author | Moon, Byung-Moo | - |
dc.contributor.author | Lee, Ji-Hoon | - |
dc.contributor.author | Koo, Sang-Mo | - |
dc.date.accessioned | 2021-09-06T19:09:44Z | - |
dc.date.available | 2021-09-06T19:09:44Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2012-06 | - |
dc.identifier.issn | 1555-130X | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/108258 | - |
dc.description.abstract | Nanocrystalline 2% Ga doped zinc oxide (GaZnO) thin films were epitaxially deposited on n-type 4H-SiC (0001) by a pulsed laser deposition (PLD) at different substrate temperatures of 250, 400, and 550 degrees C, respectively. Structural and electrical properties of nanocrystalline GaZnO thin film on 4H-SiC were investigated by using X-ray diffraction, atomic force microscopy (AFM), Hall effect measurement, transmission line method (TLM), and Auger electron spectroscopy (AES). The nanocrystalline GaZnO film deposited at 400 degrees C show the lowest resistivity of 3.3 x 10(-4) Omega cm, and highly c-axis oriented crystalline quality with being sharper and higher diffraction angle, which result in. The specific contact resistance (rho(c)), measured from the Au/Ti/GaZnO/SiC of similar to 0.05 Omega cm(2). The relative amount of activated Ga3+ ions was 2.02% in GaZnO film by AES measurement. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | AMER SCIENTIFIC PUBLISHERS | - |
dc.subject | DOPED ZNO | - |
dc.title | Nanocrystalline GaZnO Films for Transparent Electrode to Silicon Carbide | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Moon, Byung-Moo | - |
dc.identifier.doi | 10.1166/jno.2012.1304 | - |
dc.identifier.scopusid | 2-s2.0-84863699433 | - |
dc.identifier.wosid | 000307158500004 | - |
dc.identifier.bibliographicCitation | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, v.7, no.3, pp.260 - 264 | - |
dc.relation.isPartOf | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | - |
dc.citation.title | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | - |
dc.citation.volume | 7 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 260 | - |
dc.citation.endPage | 264 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | DOPED ZNO | - |
dc.subject.keywordAuthor | GaZnO | - |
dc.subject.keywordAuthor | SiC | - |
dc.subject.keywordAuthor | PLD | - |
dc.subject.keywordAuthor | AES | - |
dc.subject.keywordAuthor | XRD | - |
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