Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Degradation of dc characteristics of InAlN/GaN high electron mobility transistors by 5 MeV proton irradiation

Full metadata record
DC Field Value Language
dc.contributor.authorLo, Chien-Fong-
dc.contributor.authorLiu, L.-
dc.contributor.authorKang, T. S.-
dc.contributor.authorRen, Fan-
dc.contributor.authorSchwarz, C.-
dc.contributor.authorFlitsiyan, E.-
dc.contributor.authorChernyak, L.-
dc.contributor.authorKim, Hong-Yeol-
dc.contributor.authorKim, Jihyun-
dc.contributor.authorYun, Sang Pil-
dc.contributor.authorLaboutin, O.-
dc.contributor.authorCao, Y.-
dc.contributor.authorJohnson, J. W.-
dc.contributor.authorPearton, S. J.-
dc.date.accessioned2021-09-06T20:10:47Z-
dc.date.available2021-09-06T20:10:47Z-
dc.date.created2021-06-18-
dc.date.issued2012-05-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/108474-
dc.description.abstractThe dc characteristics of InAlN/GaN high electron mobility transistors were measured before and after irradiation with 5 MeV protons at doses up to 2 x 10(15) cm(-2). The on/off ratio degraded by two orders of magnitude for the highest dose, while the subthreshold slope increased from 77 to 122 mV/decade under these conditions. There was little change in transconductance or gate or drain currents for doses up to 2 x 10(13) cm(-2), but for the highest dose the drain current and transconductance decreased by, similar to 40% while the reverse gate current increased by a factor of similar to 6. The minority carrier diffusion length was around 1 mu m independent of proton dose. The InAlN/GaN heterostructure is at least as radiation hard as its AlGaN/GaN counterpart. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.3698402]-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectMGO-
dc.titleDegradation of dc characteristics of InAlN/GaN high electron mobility transistors by 5 MeV proton irradiation-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1116/1.3698402-
dc.identifier.wosid000305042000012-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.30, no.3-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume30-
dc.citation.number3-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusMGO-
Files in This Item
There are no files associated with this item.
Appears in
Collections
College of Engineering > Department of Chemical and Biological Engineering > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetrics

Total Views & Downloads

BROWSE