Effect of r-plane (1-102) sapphire off-cut angle on the anisotropic strain in nonpolar Si-doped a-plane (11-20) GaN
- Authors
- Kim, Ji Hoon; Park, Jung Ho; Hwang, Sung-Min; Baik, Kwang Hyeon
- Issue Date
- 5월-2012
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- Nonpolar; a-plane GaN; Metal Organic Chemical Vapor Deposition; Off-cut angle; Strain
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.60, no.10, pp.1649 - 1655
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 60
- Number
- 10
- Start Page
- 1649
- End Page
- 1655
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/108602
- DOI
- 10.3938/jkps.60.1649
- ISSN
- 0374-4884
- Abstract
- We studied the growth and the characteristics of nonpolar Si-doped a-plane GaN grown on r-plane sapphire substrates with different off-cut angles which were changed in the range of -0.2A degrees similar to +0.4A degrees. Samples grown by using -0.2A degrees and +0.2A degrees off-cut angles showed triangular pit-free and smooth surfaces, which resulted from enhanced lateral growth owing to the epitaxial films having a Ga face. On the other hand, the sample grown by using +0.4A degrees off-cut angles revealed a high density of pits and low crystalline quality due to a high density of dislocations. The strain determined by using calculations with the lattice parameters also showed a dependence on the off-cut angles. We expect r-plane sapphire with off-cut angles in the range of -0.2A degrees similar to+0.2A degrees to be very effective for improving the crystalline quality and the surface morphology of a-plane GaN.
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