Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl-2/Ar Inductively-Coupled Plasmas
DC Field | Value | Language |
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dc.contributor.author | Jang, Hanbyeol | - |
dc.contributor.author | Efremov, Alexander | - |
dc.contributor.author | Kim, Daehee | - |
dc.contributor.author | Kang, Sungchil | - |
dc.contributor.author | Yun, Sun Jin | - |
dc.contributor.author | Kwon, Kwang-Ho | - |
dc.date.accessioned | 2021-09-06T21:38:41Z | - |
dc.date.available | 2021-09-06T21:38:41Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2012-04 | - |
dc.identifier.issn | 0272-4324 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/108794 | - |
dc.description.abstract | The TiO2 etching characteristics and mechanisms in HBr/Ar and Cl-2/Ar inductively-coupled plasmas were investigated under fixed gas-mixing ratio and bias power conditions. It was found that in both systems, an increase in gas pressure from 4 to 10 mTorr results in a non-monotonic TiO2 etching rate, while a variation of input power in the range 500-800 W causes a faster-than-linear acceleration of the etching process. Plasma diagnostics performed by Langmuir probes and zero-dimensional plasma modeling provided data on plasma parameters, steady-state densities, and fluxes of the active species on the etched surface. The model-based analysis of the etching mechanism showed that for the given set of processing parameters, the TiO2 etch kinetics correspond to the transitional regime of ion-assisted chemical reaction in which a chemical-etch pathway dominates. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | SPRINGER | - |
dc.subject | MODEL-BASED ANALYSIS | - |
dc.subject | HIGH-DENSITY | - |
dc.subject | POLYSILICON | - |
dc.subject | PARAMETERS | - |
dc.subject | KINETICS | - |
dc.subject | HE | - |
dc.title | Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl-2/Ar Inductively-Coupled Plasmas | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kwon, Kwang-Ho | - |
dc.identifier.doi | 10.1007/s11090-012-9352-5 | - |
dc.identifier.scopusid | 2-s2.0-84862800914 | - |
dc.identifier.wosid | 000304173100013 | - |
dc.identifier.bibliographicCitation | PLASMA CHEMISTRY AND PLASMA PROCESSING, v.32, no.2, pp.333 - 342 | - |
dc.relation.isPartOf | PLASMA CHEMISTRY AND PLASMA PROCESSING | - |
dc.citation.title | PLASMA CHEMISTRY AND PLASMA PROCESSING | - |
dc.citation.volume | 32 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 333 | - |
dc.citation.endPage | 342 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Chemical | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Fluids & Plasmas | - |
dc.subject.keywordPlus | MODEL-BASED ANALYSIS | - |
dc.subject.keywordPlus | HIGH-DENSITY | - |
dc.subject.keywordPlus | POLYSILICON | - |
dc.subject.keywordPlus | PARAMETERS | - |
dc.subject.keywordPlus | KINETICS | - |
dc.subject.keywordPlus | HE | - |
dc.subject.keywordAuthor | TiO2 | - |
dc.subject.keywordAuthor | HBr/Ar plasma | - |
dc.subject.keywordAuthor | Cl-2/Ar plasma | - |
dc.subject.keywordAuthor | Etching mechanism | - |
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