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Fluorine contamination in yttrium-doped barium zirconate film deposited by atomic layer deposition

Authors
An, JihwanKim, Young BeomPark, Joong SunShim, Joon HyungGuer, Turgut M.Prinz, Fritz B.
Issue Date
1월-2012
Publisher
A V S AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.30, no.1
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume
30
Number
1
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/109143
DOI
10.1116/1.3670750
ISSN
0734-2101
Abstract
The authors have investigated the change of chemical composition, crystallinity, and ionic conductivity in fluorine contaminated yttrium-doped barium zirconate (BYZ) fabricated by atomic layer deposition (ALD). It has been identified that fluorine contamination can significantly affect the conductivity of the ALD BYZ. The authors have also successfully established the relationship between process temperature and contamination and the source of fluorine contamination, which was the perfluoroelastomer O-ring used for vacuum sealing. The total removal of fluorine contamination was achieved by using all-metal sealed chamber instead of O-ring seals. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3670750]
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