New approaches for micro-controlling of oxygen dopant contents in silicon-based thin films with application to multi-band gap solar cells
DC Field | Value | Language |
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dc.contributor.author | So, HyunWook | - |
dc.contributor.author | Jang, JinNyoung | - |
dc.contributor.author | Lee, DongHyeok | - |
dc.contributor.author | Hong, MunPyo | - |
dc.date.accessioned | 2021-09-06T23:57:05Z | - |
dc.date.available | 2021-09-06T23:57:05Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2012 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/109331 | - |
dc.description.abstract | Using the neutral-beam-assisted chemical vapor deposition (NBaCVD) system [5-12], an alternative technique that can control the oxygen doping in a silicon-based thin film has been developed. This brand-new technique has the ability to controlling of optical band gaps by micro-control the oxygen dopant concentrates in the nc-Si thin films. This control of the oxygen doping results in self-biasing on the internal antenna of an inductively coupled plasma (ICP) source; it also results in the hydrogen neutral beam (NB) energy being adjusted by the reflector bias. The oxygen atoms are supplied from the sputtering of an internal ICP antenna covered by a quartz tube and are eliminated by the energetic hydrogen NB in the NBaCVD system, rather than by a mass-flow-controller (MFC) used in conventional CVD. These results are observed via Fourier Transform Infrared Spectroscopy, X-ray Photoelectron Spectroscopy, Secondary Ion Mass Spectroscopy and UV-visible data. The result of this experiment allows the fabrication of multi-junction solar cells with gradually varying optical band gaps. (c) 2012 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | INDUCTIVELY-COUPLED PLASMA | - |
dc.subject | PARTICLE-BEAM | - |
dc.subject | METAL-SURFACES | - |
dc.subject | BACKPLANE | - |
dc.subject | IONS | - |
dc.title | New approaches for micro-controlling of oxygen dopant contents in silicon-based thin films with application to multi-band gap solar cells | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Hong, MunPyo | - |
dc.identifier.doi | 10.1016/j.cap.2012.05.023 | - |
dc.identifier.wosid | 000316215400015 | - |
dc.identifier.bibliographicCitation | CURRENT APPLIED PHYSICS, v.12, pp.S64 - S70 | - |
dc.relation.isPartOf | CURRENT APPLIED PHYSICS | - |
dc.citation.title | CURRENT APPLIED PHYSICS | - |
dc.citation.volume | 12 | - |
dc.citation.startPage | S64 | - |
dc.citation.endPage | S70 | - |
dc.type.rims | ART | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | INDUCTIVELY-COUPLED PLASMA | - |
dc.subject.keywordPlus | PARTICLE-BEAM | - |
dc.subject.keywordPlus | METAL-SURFACES | - |
dc.subject.keywordPlus | BACKPLANE | - |
dc.subject.keywordPlus | IONS | - |
dc.subject.keywordAuthor | NBaCVD | - |
dc.subject.keywordAuthor | Nanocrystalline silicon | - |
dc.subject.keywordAuthor | Oxygen doping | - |
dc.subject.keywordAuthor | Termination capacitor | - |
dc.subject.keywordAuthor | Neutral beam | - |
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