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Effect of oxygen partial pressure on Ag crystallite formation at screen-printed Pb-free Ag contacts of Si solar cells

Authors
Huh, Joo-YoulHong, Kyoung-KookCho, Sung-BinPark, Sung-KyunLee, Byung-ChulOkamoto, Kuninori
Issue Date
15-12월-2011
Publisher
ELSEVIER SCIENCE SA
Keywords
Semiconductors; Glasses; Crystal growth; Precipitation
Citation
MATERIALS CHEMISTRY AND PHYSICS, v.131, no.1-2, pp.113 - 119
Indexed
SCIE
SCOPUS
Journal Title
MATERIALS CHEMISTRY AND PHYSICS
Volume
131
Number
1-2
Start Page
113
End Page
119
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/110905
DOI
10.1016/j.matchemphys.2011.07.075
ISSN
0254-0584
Abstract
In order to understand the mechanism underlying the formation of Ag thick-film contacts to the emitter Si of crystalline Si solar cells, the reactions between Pb-free Ag pastes containing Bi2O3-based glass frit and an n-type (1 0 0) Si wafer during firing at 800 degrees C were examined by varying the ambient oxygen partial pressure (Po-2). When the Bi2O3-based glass frit alone was reacted with the Si wafer, the redox reaction leading to the formation of liquid Bi was insensitive to Po-2 in the firing ambient. When a mixture of glass frit with Ag powder was reacted with the Si wafer, however, the firing reaction was significantly influenced by Po-2 in the ambient gas. With increasing Po-2, the reaction leading to the formation of liquid Bi was gradually suppressed, whereas the reaction producing Ag crystallites became increasingly active, resulting in more Ag crystallites at the contact interface. The present study results strongly support the hypothesis that the Ag crystallites are formed by the reaction between the dissolved Ag+ and O2- ions in the molten glass and Si wafer without the aid of liquid Bi formation. (C) 2011 Elsevier B.V. All rights reserved.
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Huh, Joo Youl
공과대학 (신소재공학부)
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