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Effects of proton irradiation on dc characteristics of InAlN/GaN high electron mobility transistors

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dc.contributor.authorLo, C. F.-
dc.contributor.authorLiu, L.-
dc.contributor.authorRen, F.-
dc.contributor.authorKim, H. -Y.-
dc.contributor.authorKim, J.-
dc.contributor.authorPearton, S. J.-
dc.contributor.authorLaboutin, O.-
dc.contributor.authorCao, Yu-
dc.contributor.authorJohnson, J. W.-
dc.contributor.authorKravchenko, I. I.-
dc.date.accessioned2021-09-07T06:26:26Z-
dc.date.available2021-09-07T06:26:26Z-
dc.date.created2021-06-19-
dc.date.issued2011-11-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/111180-
dc.description.abstractThe effects of proton irradiation on the dc characteristics of InAlN/GaN high electron mobility transistors were investigated. In this study we used 5 MeV protons with doses varying from 2 x 10(11) to 2 x 10(15) cm(-2). The transfer resistance and contact resistivity suffered more degradation as compared to the sheet resistance. With irradiation at the highest dose of 2 x 10(15) cm(-2), both forward- and reverse-bias gate currents were increased after proton irradiation. A negative threshold-shift and reduction of the saturation drain current were also observed as a result of radiation-induced carrier scattering and carrier removal. Devices irradiated with doses of 2 x 10(11) to 2 x 10(15) cm(-2) exhibited minimal degradation of the saturation drain current and extrinsic transconductance. These results show that InAlN/GaN high electron mobility transistors are attractive for space-based applications when high-energy proton fluxes are present. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3644480]-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectPERFORMANCE-
dc.subjectGAN-
dc.titleEffects of proton irradiation on dc characteristics of InAlN/GaN high electron mobility transistors-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, J.-
dc.identifier.doi10.1116/1.3644480-
dc.identifier.scopusid2-s2.0-84255184252-
dc.identifier.wosid000298538800105-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.29, no.6-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume29-
dc.citation.number6-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusGAN-
dc.subject.keywordAuthoraluminium compounds-
dc.subject.keywordAuthorcontact resistance-
dc.subject.keywordAuthorgallium compounds-
dc.subject.keywordAuthorhigh electron mobility transistors-
dc.subject.keywordAuthorIII-V semiconductors-
dc.subject.keywordAuthorindium compounds-
dc.subject.keywordAuthorproton effects-
dc.subject.keywordAuthorwide band gap semiconductors-
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