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Enhancement of photo- and electro-luminescence of GaN-based LED structure grown on a nanometer-scaled patterned sapphire substrate

Authors
Park, HyoungwonByeon, Kyeong-JaeJang, Jong-JinNam, OkhyunLee, Heon
Issue Date
11월-2011
Publisher
ELSEVIER SCIENCE BV
Keywords
Nanoimprint lithography (NIL); GaN-based light-emitting diodes (LEDs); Nanometer-scaled patterned sapphire; substrate (NPSS); Photoluminescence (PL); Electroluminescence (EL)
Citation
MICROELECTRONIC ENGINEERING, v.88, no.11, pp.3207 - 3213
Indexed
SCIE
SCOPUS
Journal Title
MICROELECTRONIC ENGINEERING
Volume
88
Number
11
Start Page
3207
End Page
3213
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/111241
DOI
10.1016/j.mee.2011.07.014
ISSN
0167-9317
Abstract
In this study, a 2 in. sized a highly periodic nanometer-scaled patterned sapphire substrate (NPSS) was fabricated using nanoimprint lithography (NIL) and inductively coupled plasma etching to improve the light-extraction efficiency of GaN-based light-emitting diodes (LEDs). A blue LED structure was grown on the nanometer-scale patterned sapphire substrates, and the photoluminescence (PL) and electroluminescence (EL) were measured to confirm the effectiveness of the nanometer-scaled patterns on sapphire. An improvement in luminescence efficiency was observed when NPSS was applied; 2 times stronger PL intensity and 2.8 times stronger EL intensity than the LED structure grown on the unpatterned sapphire wafers were measured. These results show highly periodic nanometer-scaled patterns create multi-photon scattering and effectively enhance the light-extraction efficiency of LEDs. (C) 2011 Elsevier B.V. All rights reserved.
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공과대학 (신소재공학부)
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