Enhancement of photo- and electro-luminescence of GaN-based LED structure grown on a nanometer-scaled patterned sapphire substrate
- Authors
- Park, Hyoungwon; Byeon, Kyeong-Jae; Jang, Jong-Jin; Nam, Okhyun; Lee, Heon
- Issue Date
- 11월-2011
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Nanoimprint lithography (NIL); GaN-based light-emitting diodes (LEDs); Nanometer-scaled patterned sapphire; substrate (NPSS); Photoluminescence (PL); Electroluminescence (EL)
- Citation
- MICROELECTRONIC ENGINEERING, v.88, no.11, pp.3207 - 3213
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 88
- Number
- 11
- Start Page
- 3207
- End Page
- 3213
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/111241
- DOI
- 10.1016/j.mee.2011.07.014
- ISSN
- 0167-9317
- Abstract
- In this study, a 2 in. sized a highly periodic nanometer-scaled patterned sapphire substrate (NPSS) was fabricated using nanoimprint lithography (NIL) and inductively coupled plasma etching to improve the light-extraction efficiency of GaN-based light-emitting diodes (LEDs). A blue LED structure was grown on the nanometer-scale patterned sapphire substrates, and the photoluminescence (PL) and electroluminescence (EL) were measured to confirm the effectiveness of the nanometer-scaled patterns on sapphire. An improvement in luminescence efficiency was observed when NPSS was applied; 2 times stronger PL intensity and 2.8 times stronger EL intensity than the LED structure grown on the unpatterned sapphire wafers were measured. These results show highly periodic nanometer-scaled patterns create multi-photon scattering and effectively enhance the light-extraction efficiency of LEDs. (C) 2011 Elsevier B.V. All rights reserved.
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