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Stable Bipolar Resistive Switching Characteristics and Resistive Switching Mechanisms Observed in Aluminum Nitride-based ReRAM Devices

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dc.contributor.authorKim, Hee-Dong-
dc.contributor.authorAn, Ho-Myoung-
dc.contributor.authorLee, Eui Bok-
dc.contributor.authorKim, Tae Geun-
dc.date.accessioned2021-09-07T07:59:37Z-
dc.date.available2021-09-07T07:59:37Z-
dc.date.created2021-06-18-
dc.date.issued2011-10-
dc.identifier.issn0018-9383-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/111520-
dc.description.abstractThe authors report upon the ultrafast bipolar switching characteristics observed in aluminum nitride (AlN)-based resistive random access memory devices ReRAMs. The set and reset states were measured to be as low as 2 mu A and 5 nA, respectively, at V-read = 0.1 V. Regarding pulse operations, very fast switching characteristics were achieved at 3 V/10 ns for the set operation and -3 V/10 ns for the reset operation. In addition, the AlN-based ReRAMs showed an endurance value of over similar to 10(8) cycles and a retention time of over ten years at 85 degrees C. These results show that this AlN-based ReRAM can be used as a promising high-speed nonvolatile memory device.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectMEMORY-
dc.subjectLAYERS-
dc.titleStable Bipolar Resistive Switching Characteristics and Resistive Switching Mechanisms Observed in Aluminum Nitride-based ReRAM Devices-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Tae Geun-
dc.identifier.doi10.1109/TED.2011.2162518-
dc.identifier.scopusid2-s2.0-80053195087-
dc.identifier.wosid000295100300044-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON ELECTRON DEVICES, v.58, no.10, pp.3566 - 3573-
dc.relation.isPartOfIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.titleIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.volume58-
dc.citation.number10-
dc.citation.startPage3566-
dc.citation.endPage3573-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusMEMORY-
dc.subject.keywordPlusLAYERS-
dc.subject.keywordAuthorAtomic force microscopy (AFM)-
dc.subject.keywordAuthoraluminum nitride (AlN)-
dc.subject.keywordAuthorresistive switching (RS)-
dc.subject.keywordAuthorspace-charge-limited conduction (SCLC)-
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