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Microstructural and electrochemical properties of Ti-doped Al2O3 coated LiCoO2 films
- Authors
- Choi, Ji-Ae; Lee, Seong-Rae; Cho, Won-Il; Cho, Byung-Won
- Issue Date
- 8월-2011
- Publisher
- KOREAN INST METALS MATERIALS
- Keywords
- encrgy storage materials; sputtering; electrochemistry; LiCoO2; TiAlO coating
- Citation
- METALS AND MATERIALS INTERNATIONAL, v.17, no.4, pp.649 - 654
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- METALS AND MATERIALS INTERNATIONAL
- Volume
- 17
- Number
- 4
- Start Page
- 649
- End Page
- 654
- ISSN
- 1598-9623
- Abstract
- We studied the microstructural and electrochemical properties of Ti-doped Al2O3 (Ti-Al2O3) coated LiCoO2 thin films depending on the Ti composition. The 1.27 at.% Ti-Al2O3 coated films had an amorphous structure with better conductivity than that of pure Al2O3 films. The Ti-Al2O3 coating layer effectively suppressed the dissolution of Co and the formation of lower Li conductivity SEI films at the interface between the LiCoO2 film and electrolyte. The Ti-Al2O3 coating improved the cycling performance and capacity retention at high voltage (4.5 V) of the LiCoO2 films. The Ti-Al2O3 coated LiCoO2 films showed better electrochemical properties than did the pure Al2O3 coated LiCoO2 films. These results were closely related to the enhanced Li-conductivity and interfacial quality of the Ti-Al2O3 film.
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