스퍼터링 중 외부자기장이 자성박막의 자기적 특성에 미치는 영향
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 안현태 | - |
dc.contributor.author | 임상호 | - |
dc.contributor.author | 지광구 | - |
dc.contributor.author | 한준현 | - |
dc.date.accessioned | 2021-09-07T18:02:14Z | - |
dc.date.available | 2021-09-07T18:02:14Z | - |
dc.date.created | 2021-06-17 | - |
dc.date.issued | 2011 | - |
dc.identifier.issn | 1738-8228 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/113840 | - |
dc.description.abstract | A magnetic device which enables the application of a strong and uniform magnetic field to thin film during sputtering was designed for controlling the magnetic anisotropy using a three dimensional finite element method, and the effects of the external magnetic field on the magnetic properties of sputtered thin films were investigated. Both the intensity and the uniformity of the magnetic flux density in the sputter zone (50 mm ×50 mm) was dependent on not only the shape and size of the magnet device but also the magnitude of stray fields from the magnet. For the magnet device in which the distance between two magnets or two pure iron bars was 80-90 mm, the magnetic flux density along the direction normal to the external magnetic field direction was minimum. The two row magnets increased the magnetic flux density and uniformity along the external magnetic field direction. An Fe thin film sputtered using the optimized magnet device showed a higher remanence ratio than that fabricated under no external magnetic field. | - |
dc.language | Korean | - |
dc.language.iso | ko | - |
dc.publisher | 대한금속·재료학회 | - |
dc.title | 스퍼터링 중 외부자기장이 자성박막의 자기적 특성에 미치는 영향 | - |
dc.title.alternative | Effects of an External Magnetic Field on the Magnetic Properties of Sputtered Magnetic Thin Films | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | 임상호 | - |
dc.identifier.bibliographicCitation | 대한금속·재료학회지, v.49, no.06, pp.505 - 513 | - |
dc.relation.isPartOf | 대한금속·재료학회지 | - |
dc.citation.title | 대한금속·재료학회지 | - |
dc.citation.volume | 49 | - |
dc.citation.number | 06 | - |
dc.citation.startPage | 505 | - |
dc.citation.endPage | 513 | - |
dc.type.rims | ART | - |
dc.identifier.kciid | ART001558787 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.subject.keywordAuthor | magnetic thin film | - |
dc.subject.keywordAuthor | magnetic anisotropy | - |
dc.subject.keywordAuthor | magnetic field sputtering | - |
dc.subject.keywordAuthor | finite element method | - |
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