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Observation of Suppressed Interdiffusion in FeRh/FePt-Ta Bilayer Thin Films
- Authors
- Jang, Sung-Uk; Park, Eon Byeong; Kim, Ji-Hong; Park, Ki-Hoon; Lee, Ji Sung; Kim, Young Keun; Hyun, Seungmin; Lee, Hak-Joo; Kwon, Soon-Ju; Lee, Hwan-Soo
- Issue Date
- Jun-2010
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- Keywords
- FePt-Ta; FeRh/FePt-Ta bilayer; ferromagnetic and antiferromagentic transition; interdiffusion
- Citation
- IEEE TRANSACTIONS ON MAGNETICS, v.46, no.6, pp.2104 - 2107
- Indexed
- SCIE
SCOPUS
- Journal Title
- IEEE TRANSACTIONS ON MAGNETICS
- Volume
- 46
- Number
- 6
- Start Page
- 2104
- End Page
- 2107
- ISSN
- 0018-9464
- Abstract
- FeRh/FePt bilayers onMgO (100) substrates were fabricated by rf-magnetron sputtering, and the magnetic properties and microstructures of the bilayers were studied in terms of Ta addition to the storage layer. Compared to undoped FeRh/FePt bilayers, FeRh/FePt-Ta bilayer films showed improved magnetic properties and lower degree of interdiffusion. The FeRh/FePt-Ta bilayers clearly demonstrated the AFM-FM transition. Reduced interdiffusion by Ta segregation along grain boundaries was speculated to be a possible cause for the observed improvement in magnetic properties when fabricated at high temperature.
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Related Researcher
- Kim, Young Keun
- College of Engineering (Department of Materials Science and Engineering)