Fabrication of sub-micron 3-D structure using duo-mold UV-RIL process
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Han, Kang-Soo | - |
dc.contributor.author | Hong, Sung-Hoon | - |
dc.contributor.author | Jeong, Jun-Ho | - |
dc.contributor.author | Lee, Heon | - |
dc.date.accessioned | 2021-09-08T04:19:07Z | - |
dc.date.available | 2021-09-08T04:19:07Z | - |
dc.date.created | 2021-06-11 | - |
dc.date.issued | 2010-04 | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/116760 | - |
dc.description.abstract | 3-D polymeric micro- and nano-structures were fabricated by the reversal imprint lithography technique using nano-patterned molds. A surface-treated quartz mold and a water-soluble poly vinyl alcohol (PVA) mold were used to make dual-side patterned, 2-D polymeric, micro- and nano-structures. First, UV-curable, polymeric resin was dropped onto the quartz mold, which was then covered with the PVA mold. The two stacked molds were pressed and exposed to UV-Iight to cure the resin. The cured polymeric resin (the reversal layer) was easily released from the quartz mold, because the surface of the latter was treated with an anti-stiction layer. The reversal layer, bound to the PVA mold, was transferred to a Si substrate by applying a thin layer of a UV-curable bonding agent. After bonding the reversal layer, the PVA mold was selectively removed by dipping in water. As a result, the dual-side patterned, thin polymeric 2-D structure was formed on the silicon substrate and, by repeating this process, 2-D nano-structures were stacked to form a 3-D nano-structure. By making use of the anti-stiction-treated, quartz mold and the water-soluble characteristic of the PVA material, the reliable release of the reversal layer was achieved. (C) 2009 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | NANOIMPRINT LITHOGRAPHY | - |
dc.subject | IMPRINT LITHOGRAPHY | - |
dc.subject | SUBSTRATE | - |
dc.subject | POLYMER | - |
dc.title | Fabrication of sub-micron 3-D structure using duo-mold UV-RIL process | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Heon | - |
dc.identifier.doi | 10.1016/j.mee.2009.08.022 | - |
dc.identifier.scopusid | 2-s2.0-75149178562 | - |
dc.identifier.wosid | 000275264200016 | - |
dc.identifier.bibliographicCitation | MICROELECTRONIC ENGINEERING, v.87, no.4, pp.610 - 613 | - |
dc.relation.isPartOf | MICROELECTRONIC ENGINEERING | - |
dc.citation.title | MICROELECTRONIC ENGINEERING | - |
dc.citation.volume | 87 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | 610 | - |
dc.citation.endPage | 613 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | NANOIMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | IMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | SUBSTRATE | - |
dc.subject.keywordPlus | POLYMER | - |
dc.subject.keywordAuthor | PVA(poly vinyl alcohol) | - |
dc.subject.keywordAuthor | RIL(reversal imprint lithography) | - |
dc.subject.keywordAuthor | NIL(nano-imprint lithography) | - |
dc.subject.keywordAuthor | Residual thickness | - |
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