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A Model-Based Analysis of Plasma Parameters and Composition in HBr/X (X=Ar, He, N-2) Inductively Coupled Plasmas

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dc.contributor.authorKwon, Kwang-Ho-
dc.contributor.authorEfremov, Alexander-
dc.contributor.authorKim, Moonkeun-
dc.contributor.authorMin, Nam Ki-
dc.contributor.authorJeong, Jaehwa-
dc.contributor.authorKim, Kwangsoo-
dc.date.accessioned2021-09-08T10:25:31Z-
dc.date.available2021-09-08T10:25:31Z-
dc.date.created2021-06-11-
dc.date.issued2010-
dc.identifier.issn0013-4651-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/118667-
dc.description.abstractThis work discusses the effect of gas mixing ratio on the HBr/X (X=Ar, He, or N-2) plasma parameters, steady-state densities, and fluxes of active species in the planar inductively coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probes and a global (zero-dimensional) plasma model with Maxwellian approximation for the electron energy distribution function. The dilution of HBr by Ar results in a maximum effect on the HBr electron impact dissociation kinetics and provides a favorable condition for an ion-assisted chemical reaction.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELECTROCHEMICAL SOC INC-
dc.subjectELECTRON-ENERGY DISTRIBUTION-
dc.subjectACTIVE SPECIES KINETICS-
dc.subjectMODULATED HIGH-DENSITY-
dc.subjectGLOBAL-MODEL-
dc.subjectSURFACE KINETICS-
dc.subjectDISCHARGES-
dc.subjectBROMINE-
dc.subjectAR-
dc.subjectRECOMBINATION-
dc.subjectPOLYSILICON-
dc.titleA Model-Based Analysis of Plasma Parameters and Composition in HBr/X (X=Ar, He, N-2) Inductively Coupled Plasmas-
dc.typeArticle-
dc.contributor.affiliatedAuthorKwon, Kwang-Ho-
dc.contributor.affiliatedAuthorMin, Nam Ki-
dc.contributor.affiliatedAuthorJeong, Jaehwa-
dc.identifier.doi10.1149/1.3362943-
dc.identifier.scopusid2-s2.0-77951202134-
dc.identifier.wosid000276555300072-
dc.identifier.bibliographicCitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.5, pp.H574 - H579-
dc.relation.isPartOfJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.citation.titleJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.citation.volume157-
dc.citation.number5-
dc.citation.startPageH574-
dc.citation.endPageH579-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.subject.keywordPlusELECTRON-ENERGY DISTRIBUTION-
dc.subject.keywordPlusACTIVE SPECIES KINETICS-
dc.subject.keywordPlusMODULATED HIGH-DENSITY-
dc.subject.keywordPlusGLOBAL-MODEL-
dc.subject.keywordPlusSURFACE KINETICS-
dc.subject.keywordPlusDISCHARGES-
dc.subject.keywordPlusBROMINE-
dc.subject.keywordPlusAR-
dc.subject.keywordPlusRECOMBINATION-
dc.subject.keywordPlusPOLYSILICON-
dc.subject.keywordAuthorargon-
dc.subject.keywordAuthorelectron impact dissociation-
dc.subject.keywordAuthorgas mixtures-
dc.subject.keywordAuthorhelium-
dc.subject.keywordAuthorhydrogen compounds-
dc.subject.keywordAuthorLangmuir probes-
dc.subject.keywordAuthornitrogen-
dc.subject.keywordAuthorplasma chemistry-
dc.subject.keywordAuthorplasma density-
dc.subject.keywordAuthorplasma simulation-
dc.subject.keywordAuthorreaction kinetics theory-
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