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1. Journal Articles(College of Science and Technology > Department of Electro-Mechanical Systems Engineering > 1. Journal Articles)318

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Collection's Items (Sorted by Submit Date in Descending order): 1 to 20 of 318

SCIESCOPUS
Individual Effects of Various Plasma-Related Factors on the High Aspect Ratio Oxide Etching Process at Low-Frequency Bias Power Using an Inductively Coupled Plasma System

Son, Hye Jun; Efremov, Alexander; Choi, Gilyoung; Kwon, Kwang-Ho

ArticleIssue Date2023CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.44, no.1, pp 635 - 649PublisherSPRINGER
SCIESCOPUS
On mechanisms to control SiO<sub>2</sub> etching kinetics in low-power reactive-ion etching process using CF<sub>4</sub> + C<sub>4</sub>F<sub>8</sub> + Ar + He plasma

Choi, Gilyoung; Efremov, Alexander; Lee, Dae-Kug; Cho, Choong-Ho; Kwon, Kwang-Ho

ArticleIssue Date2023CitationVACUUM, v.216PublisherPERGAMON-ELSEVIER SCIENCE LTD
SCIESCOPUS
Noble gas effect on ACL etching selectivity to SiO2 filmsopen access

Choi, Gilyoung; Efremov, Alexander; Son, Hye Jun; Kwon, Kwang-Ho

ArticleIssue Date2023CitationPLASMA PROCESSES AND POLYMERS, v.20, no.8PublisherWILEY-V C H VERLAG GMBH
SCIESCOPUS
On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF4, CHF3, and C4F8 Gases Mixed with Oxygenopen access

Baek, Seung Yong; Efremov, Alexander; Bobylev, Alexander; Choi, Gilyoung; Kwon, Kwang-Ho

ArticleIssue Date2023CitationMATERIALS, v.16, no.14PublisherMDPI
SCIESCOPUS
Effects of initial charge on triboelectrification of plastics

Yoo, Jongdeok; Kang, Seong Gu; Kim, Ki Hong; Jeong, Jaehwa

ArticleIssue Date2023CitationWASTE MANAGEMENT, v.166, pp 133 - 140PublisherPERGAMON-ELSEVIER SCIENCE LTD
SCIESCOPUS
High withstand voltage pressure sensors for climate control systems

Han, Ji-Hoon; Kim, Ki Beom; Kim, Joon Hyub; Min, Nam Ki

ArticleIssue Date2021CitationSENSORS AND ACTUATORS A-PHYSICAL, v.321PublisherELSEVIER SCIENCE SA
SCIESCOPUS
Effect of Varying the Semiconducting/Metallic Tube Ratio on the Performance of Mixed Single-Walled Carbon Nanotube Network Gas Sensors

Min, Sung Joon; Kim, Jin Woong; Kim, Joon Hyub; Choi, Joon Hyock; Park, Chan Won; Min, Nam Ki

ArticleIssue Date2017CitationJOURNAL OF NANOMATERIALS, v.2017PublisherHINDAWI LTD
SCIESCOPUS
High-aspect-ratio oxide etching using CF4/C6F12O plasma in an inductively coupled plasma etching system with low-frequency bias power

Kim, Jinhyuk; Choi, Gilyoung; Kwon, Kwang-Ho

ArticleIssue Date2023CitationPLASMA PROCESSES AND POLYMERS, v.20, no.3PublisherWILEY-V C H VERLAG GMBH
SCIESCOPUS
Smartphone Sensor-Based Human Motion Characterization with Neural Stochastic Differential Equations and Transformer Modelopen access

Lee, Juwon; Kim, Taehwan; Park, Jeongho; Park, Jooyoung

ArticleIssue Date2022CitationSENSORS, v.22, no.19PublisherMDPI
SCIESCOPUS
On mechanisms influencing etching/polymerization balance in multi-component fluorocarbon gas mixtures

Efremov, Alexander; Son, Hye Jun; Choi, Gilyoung; Kwon, Kwang-Ho

ArticleIssue Date2022CitationVACUUM, v.206PublisherPERGAMON-ELSEVIER SCIENCE LTD
SCOPUSKCI
Investigation of the Necessity of Past Input/output Information in Reinforcement Learning based Robust Control

Shim, H.; Kim, J.W.; Park, J.

ArticleIssue Date2021CitationTransactions of the Korean Institute of Electrical Engineers, v.70, no.12, pp 1953 - 1957PublisherKorean Institute of Electrical Engineers
KCI
대조 학습 기반 사전 학습과 생성 모델의 시너지 탐구

최창균; 김태환; 박종호; 이주원; 남상우; 박주영

ArticleIssue Date2021Citation한국통신학회논문지, v.46, no.12, pp 2319 - 2326Publisher한국통신학회
SCIESCOPUS
<p>ARTICLE INFO Keywords: SiOC Plasma parameters Ion flux Radical flux Etching Damage Dielectric constant Ion bombardment UV radiation</p>

Oh, Younghun; Efremov, Alexander; Lee, Junmyung; Lee, Jongchan; Choi, Yeonsik; Kwon, Kwang-Ho

ArticleIssue Date2022CitationTHIN SOLID FILMS, v.749PublisherELSEVIER SCIENCE SA
SCIESCOPUS
<p>A self-powered absolute shaft encoder based on triboelectric nanogenerator</p>

Lee, Yongjoo; Kang, Seong Gu; Jeong, Jaehwa

ArticleIssue Date2022CitationNANO ENERGY, v.98PublisherELSEVIER
SCIE
Etching Characteristics of Low-k Dielectric Using C(5)H2F(10) Liquefied Gas Plasma for Mitigating of Global Warming Potential

Choi, Yeonsik; Lee, Jongchan; Oh, Younghun; Lee, Hyun Woo; Kwon, Kwang-Ho

ArticleIssue Date2021CitationSCIENCE OF ADVANCED MATERIALS, v.13, no.9, pp 1764 - 1770PublisherAMER SCIENTIFIC PUBLISHERS
SCIESCOPUS
Comparative study of CF4 + O-2 and C6F12O + O-2 plasmas for reactive-ion etching applications

Lim, Nomin; Efremov, Alexander; Woo, Byungjun; Kwon, Kwang-Ho

ArticleIssue Date2022CitationPLASMA PROCESSES AND POLYMERS, v.19, no.2PublisherWILEY-V C H VERLAG GMBH
SCIESCOPUS
A Comparison of CF4, CHF3 and C4F8 + Ar/O-2 Inductively Coupled Plasmas for Dry Etching Applications

Lim, Nomin; Efremov, Alexander; Kwon, Kwang-Ho

ArticleIssue Date2021CitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.41, no.6, pp 1671 - 1689PublisherSPRINGER
SCIESCOPUS
Predicting Human Motion Signals Using Modern Deep Learning Techniques and Smartphone Sensors

Kim, Taehwan; Park, Jeongho; Lee, Juwon; Park, Jooyoung

ArticleIssue Date2021CitationSENSORS, v.21, no.24PublisherMDPI
SCIESCOPUS
Comparative study of Cl2 + O2 and HBr + O2 plasma chemistries in respect to silicon reactive-ion etching process

Lim, N.; Efremov, A.; Kwon, K.-H.

ArticleIssue Date2021CitationVacuum, v.186PublisherElsevier Ltd
SCIESCOPUS
On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures

Efremov, Alexander; Lee, Byung Jun; Kwon, Kwang-Ho

ArticleIssue Date2021CitationMATERIALS, v.14, no.6PublisherMDPI
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