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Purification of metallurgical-grade silicon in fractional melting process

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dc.contributor.authorLee, Woosoon-
dc.contributor.authorYoon, Wooyoung-
dc.contributor.authorPark, Choonghwan-
dc.date.accessioned2021-09-08T10:39:35Z-
dc.date.available2021-09-08T10:39:35Z-
dc.date.created2021-06-11-
dc.date.issued2009-12-15-
dc.identifier.issn0022-0248-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/118742-
dc.description.abstractThe fractional melting process involves heating an alloy within its liquid-solid region, while simultaneously ejecting liquid from the solid-liquid mixture (the cake). The extent of purification obtained is comparable to that obtained in multi-pass zone refining. A new fractional melting process, in which the centrifugal force is used for separating the liquid from the cake, was developed and applied to the purification of metallurgical grade Si (MG-Si). The major impurities in MG-Si such as Fe, Ti, Al, and Cu can significantly degrade the efficiency of solar cells. So it is important to remove these metal elements from MG-Si to obtain high-quality silicon. Since these elements have low segregation coefficients in silicon, high purification is possible through the fractional melting process. By applying the fractional melting method, a mean refining ratio of 93% with a wetness of 0.038 was achieved during the refining of 2N-Si. A further increase in the refining ratio can be realized by either controlling the processing parameters or reducing the solid fraction. (C) 2009 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER-
dc.titlePurification of metallurgical-grade silicon in fractional melting process-
dc.typeArticle-
dc.contributor.affiliatedAuthorYoon, Wooyoung-
dc.identifier.doi10.1016/j.jcrysgro.2009.09.050-
dc.identifier.scopusid2-s2.0-70449497818-
dc.identifier.wosid000272900800027-
dc.identifier.bibliographicCitationJOURNAL OF CRYSTAL GROWTH, v.312, no.1, pp.146 - 148-
dc.relation.isPartOfJOURNAL OF CRYSTAL GROWTH-
dc.citation.titleJOURNAL OF CRYSTAL GROWTH-
dc.citation.volume312-
dc.citation.number1-
dc.citation.startPage146-
dc.citation.endPage148-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaCrystallography-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryCrystallography-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordAuthorPurification-
dc.subject.keywordAuthorFractional melting-
dc.subject.keywordAuthorWetness-
dc.subject.keywordAuthorRefining-
dc.subject.keywordAuthorMetallurgical grade silicon-
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