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Replication of high ordered nano-sphere array by nanoimprint lithography
- Issue Date
- 12월-2009
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- UV nanoimprint lithography; Hot embossing; DLC coating; Flexible polymer template
- Citation
- MICROELECTRONIC ENGINEERING, v.86, no.12, pp.2423 - 2426
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 86
- Number
- 12
- Start Page
- 2423
- End Page
- 2426
- ISSN
- 0167-9317
- Abstract
- High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate. (C) 2009 Published by Elsevier B.V.
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