Inductively-Coupled Nitrous-Oxide Plasma Etching of Parylene-C Films
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shutov, D. A. | - |
dc.contributor.author | Kang, Seung-Youl | - |
dc.contributor.author | Baek, Kyu-Ha | - |
dc.contributor.author | Suh, Kyung-Soo | - |
dc.contributor.author | Kwon, Kwang-Ho | - |
dc.date.accessioned | 2021-09-08T12:03:53Z | - |
dc.date.available | 2021-09-08T12:03:53Z | - |
dc.date.created | 2021-06-11 | - |
dc.date.issued | 2009-11 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/119025 | - |
dc.description.abstract | In this article, we report results obtained from a study carried out on inductively-coupled plasma (ICP) etching of poly-monochloro-para-xylylene (parylene-C) thin films using N2O gas. The effects of the process parameters on the etch rate were investigated and are discussed in this work in terms of plasma parameter measurement performed using a Langmuir probe and modeling calculations. Process parameters of interest include the ICP source power and bias power. Oxygen atoms O(P-3) were shown to be the major etching agent of polymer. At the same time, we propose that while positive ions are not an effective etchant, they play an important role as an effective channel of energy transfer from the plasma to the polymer. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.subject | POTENTIAL-ENERGY SURFACE | - |
dc.subject | AB-INITIO | - |
dc.subject | N2O DISSOCIATION | - |
dc.subject | OXYGEN-ATOMS | - |
dc.subject | RECOMBINATION | - |
dc.subject | DISCHARGES | - |
dc.subject | DIFFUSION | - |
dc.subject | ALUMINUM | - |
dc.subject | KINETICS | - |
dc.subject | WALL | - |
dc.title | Inductively-Coupled Nitrous-Oxide Plasma Etching of Parylene-C Films | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kwon, Kwang-Ho | - |
dc.identifier.doi | 10.3938/jkps.55.1836 | - |
dc.identifier.scopusid | 2-s2.0-73249126037 | - |
dc.identifier.wosid | 000271856300017 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.5, pp.1836 - 1840 | - |
dc.relation.isPartOf | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 55 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 1836 | - |
dc.citation.endPage | 1840 | - |
dc.type.rims | ART | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.identifier.kciid | ART001497281 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.subject.keywordPlus | POTENTIAL-ENERGY SURFACE | - |
dc.subject.keywordPlus | AB-INITIO | - |
dc.subject.keywordPlus | N2O DISSOCIATION | - |
dc.subject.keywordPlus | OXYGEN-ATOMS | - |
dc.subject.keywordPlus | RECOMBINATION | - |
dc.subject.keywordPlus | DISCHARGES | - |
dc.subject.keywordPlus | DIFFUSION | - |
dc.subject.keywordPlus | ALUMINUM | - |
dc.subject.keywordPlus | KINETICS | - |
dc.subject.keywordPlus | WALL | - |
dc.subject.keywordAuthor | Parylene-C | - |
dc.subject.keywordAuthor | Nitrous-oxide plasma | - |
dc.subject.keywordAuthor | Etching mechanism | - |
dc.subject.keywordAuthor | N2O plasma modeling | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
145 Anam-ro, Seongbuk-gu, Seoul, 02841, Korea+82-2-3290-2963
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.